An optical emission spectroscopy study of a reactive magnetron sputtering Ar-O2 discharge modulated at low frequency

Modeling of reactive sputtering of compound materials

S. Berg, Hans‐Olof Blom, T. Larsson et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1987 · 373 citations

Natural Sciences, Materials Engineering, Materials Science +13

Gas density reduction effects in magnetrons

S. M. Rossnagel · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1988 · 274 citations

Natural Sciences, Nuclear Engineering, Physics +16

Reactive high rate D.C. sputtering: Deposition rate, stoichiometry and features of TiOx and TiNx films with respect to the target mode

S. Schiller, G. Beister, William K. Sieber · Thin Solid Films · 1984 · 145 citations

Natural Sciences, Materials Engineering, Materials Science +17

Optical spectroscopy for diagnostics and process control during glow discharge etching and sputter deposition

J. E. Greene · Journal of Vacuum Science and Technology · 1978 · 99 citations

Natural Sciences, Materials Science, Physics +16

Partial pressure control of reactively sputtered titanium nitride

A. F. Hmiel · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1985 · 83 citations

Natural Sciences, Materials Engineering, Materials Science +13