Applied Physics Letters · 1999 · 35 citations · 7 references
Wide-bandgap SemiconductorEngineeringOptoelectronic DevicesP-contact LayerBand EdgeSemiconductorsElectronic DevicesPhotodetectorsCompound SemiconductorPhotonicsElectrical EngineeringOptoelectronic MaterialsAluminum Gallium NitrideDevice PerformanceLateral Field DistributionCategoryiii-v SemiconductorApplied PhysicsGan Power DeviceOptoelectronics
We report on the improved device performance of GaN-based ultraviolet heterojunction photodiodes using a semi-transparent p-contact device structure. At a reverse bias of 10 V, these photodiodes exhibit a low dark current density of 0.3 nA/cm2. The external quantum efficiency is 38% at the band edge, with only a slight decrease at the shorter wavelengths. The forward current is >10 mA at Vf=5 V. Fitting of the forward current–voltage data to the diode equation yields a very low series resistance (Rs=62Ω), which results in a very fast decay of the time response. The improved performance afforded by the thin, semi-transparent, p-contact layer is due to an increase in the uniformity of the lateral field distribution.
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Low-resistance ohmic contacts to <i>p</i>-type GaN
Jin‐Kuo Ho, Charng-Shyang Jong, Chien C. Chiu et al. · Applied Physics Letters · 1999 · 288 citations
Low noise <i>p-</i>π<i>-n</i> GaN ultraviolet photodetectors
A. Osinsky, S. Gangopadhyay, R. Gaška et al. · Applied Physics Letters · 1997 · 229 citations
High-transparency Ni/Au ohmic contact to <i>p</i>-type GaN
Jinn‐Kong Sheu, Yan‐Kuin Su, G. C. et al. · Applied Physics Letters · 1999 · 214 citations
Materials Science, Wide-bandgap Semiconductor, Electrical Engineering +11