Current Applied Physics · 2014 · 79 citations · 19 references
Materials ScienceElectrical EngineeringEngineeringChannel ThicknessOxide ElectronicsApplied PhysicsElectrical PerformanceAmorphous SolidAtomic LayerThin Film ProcessingSemiconductor Device
19
Ye Wang, Xiao Wei Sun, Gregory K. L. Goh et al. · IEEE Transactions on Electron Devices · 2010 · 143 citations
Engineering, Thin Film Process Technology, Channel Layer Thickness +16