Amorphous Thin Films

Amorphous Thin Films is a type of thin-film material characterized by a non-crystalline atomic structure and lacking long-range order, typically produced through chemical vapor deposition or related techniques within the broader class of amorphous electronic materials.

6.5K

Publications

278.5K

Citations

19.5K

Authors

2.7K

Institutions

Publications per year

2017–2026

785

Authors

19.5K

  1. HH
    Hideo Hosono

    Tokyo Institute of Technology, Japan

    31 publications · 4.2K citations

    26

    h-index

  2. BK
    Beng Kang Tay

    Nanyang Technological University, Singapore

    39 publications · 1.6K citations

    26

    h-index

  3. SR
    S. Ravi P. Silva

    University of Surrey, United Kingdom

    32 publications · 3.5K citations

    23

    h-index

  4. TK
    Toshio Kamiya

    Tokyo Institute of Technology, Japan

    24 publications · 3.7K citations

    22

    h-index

  5. HK
    Hideya Kumomi

    Canon (Japan), Japan

    24 publications · 2.7K citations

    19

    h-index

1–5 of 19.5K

Venues

  1. Applied Physics Letters

    469 publications · 27.7K citations

    83

    h-index

  2. Journal of Applied Physics

    546 publications · 30.4K citations

    79

    h-index

  3. Thin Solid Films

    520 publications · 19.1K citations

    62

    h-index

  4. Journal of Non-Crystalline Solids

    337 publications · 11.3K citations

    48

    h-index

  5. Journal of The Electrochemical Society

    JES · 125 publications · 7K citations

    46

    h-index

1–5