The use of ?actinometer? gases in optical diagnostics of plasma etching mixtures: SF6-O2

Optical emission spectroscopy of reactive plasmas: A method for correlating emission intensities to reactive particle density

J. W. Coburn, Min Chen · Journal of Applied Physics · 1980 · 880 citations

Natural Sciences, Physics, Optics +16

Plasma etching of Si and SiO2—The effect of oxygen additions to CF4 plasmas

C. J. Mogab, A. C. Adams, Daniel Flamm · Journal of Applied Physics · 1978 · 565 citations

Natural Sciences, Materials Science, Physics +14

The reaction of fluorine atoms with silicon

Daniel Flamm, Vincent M. Donnelly, J. A. Mucha · Journal of Applied Physics · 1981 · 332 citations

Natural Sciences, Chemistry, Materials Science +17

Spectroscopic diagnostics of CF4-O2 plasmas during Si and SiO2 etching processes

Riccardo d’Agostino, F. Cramarossa, S. De Benedictis et al. · Journal of Applied Physics · 1981 · 303 citations

Natural Sciences, Materials Science, Physics +16

Plasma etching of Si and SiO2 in SF6–O2 mixtures

Riccardo d’Agostino, Daniel Flamm · Journal of Applied Physics · 1981 · 272 citations

Natural Sciences, Materials Engineering, Materials Science +16