Publication | Closed Access
Mechanism of compensation in heavily silicon-doped gallium arsenide grown by molecular beam epitaxy
126
Citations
16
References
1987
Year
SemiconductorsSemiconductor TechnologyEpitaxial GrowthOptical MaterialsEngineeringSiga DonorsPhysicsCrystalline DefectsOptoelectronic MaterialsApplied PhysicsSilicon-doped GaasSemiconductor MaterialsOptoelectronic DevicesMolecular Beam EpitaxyCategoryiii-v SemiconductorOptoelectronicsCompound SemiconductorSilicon-doped Gallium
Silicon-doped GaAs grown by molecular beam epitaxy has been characterized by Hall measurements, infrared local vibrational mode (LVM) absorption, secondary ion and laser source mass spectroscopy. Highly doped samples with [Si]∼3×1019 cm−3 show only a low carrier concentration of 8×1017 cm−3. LVM spectroscopy shows that SiGa donors are compensated predominantly by [Si-X] complexes, where X has been assigned previously to a gallium vacancy (VGa). Other compensating impurities are not present in the layers at significant concentrations.
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1983 | 955 | |
1981 | 151 | |
1983 | 78 | |
1974 | 72 | |
1982 | 67 | |
1984 | 62 | |
1983 | 59 | |
1985 | 58 | |
1985 | 55 | |
1983 | 50 |
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