Characterization of KrF excimer laser annealed PECVD SixGe1−x for MEMS post-processing

Melting Temperature and Explosive Crystallization of Amorphous Silicon during Pulsed Laser Irradiation

Michael O. Thompson, G. J. Galvin, J. W. Mayer et al. · Physical Review Letters · 1984 · 566 citations

Materials Science, Engineering, Energy Densities +12

Semiconductor to metal phase transition in the nucleation and growth of VO2 nanoparticles and thin films

Jae Yong Suh, René López, L. C. Feldman et al. · Journal of Applied Physics · 2004 · 358 citations

Engineering, Crystal Growth Technology, Colloidal Nanocrystals +16

Excimer laser-induced temperature field in melting and resolidification of silicon thin films

Mutsuko Hatano, Seung Jae Moon, Minghong Lee et al. · Journal of Applied Physics · 2000 · 180 citations

Optical Materials, Engineering, Crystal Growth Technology +21

Mechanical stress as a function of temperature in aluminum films

Donald S. Gardner, P. A. Flinn · IEEE Transactions on Electron Devices · 1988 · 163 citations

Engineering, Severe Plastic Deformation, Mechanical Engineering +19

High performance poly-Si TFTs fabricated using pulsed laser annealing and remote plasma CVD with low temperature processing

A Kohno, Toshiyuki Sameshima, Naoki Sano et al. · IEEE Transactions on Electron Devices · 1995 · 154 citations

Engineering, Plasma Hydrogenation, Thin Film Process Technology +16