Laser Annealing is a thermal processing technique in which a laser serves as the energy source to selectively heat and modify the microstructure of thin films or semiconductor materials, distinguished by its precision, rapid heating-cooling cycles, and minimal thermal impact on surrounding regions.
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2017–2026
220
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Laser Thermal Annealing
Publications
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Authors
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- JN
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- JF
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- GF
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- ALAntonino La Magna
Institute for Microelectronics and Microsystems, Italy
22 publications · 547 citations
15
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- CPCostas P. Grigoropoulos
University of California, Berkeley, United States
17 publications · 671 citations
14
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Institutions
974
Oak Ridge National Laboratory
Oak Ridge, United States
24 h-index
112 publications
9.5K citations
Centre National de la Recherche Scientifique
Paris, France
21 h-index
135 publications
3.4K citations
Institute for Microelectronics and Microsystems
Catania, Italy
17 h-index
146 publications
4K citations
University of California, Berkeley
Berkeley, United States
16 h-index
78 publications
3.1K citations
National University of Singapore
Singapore, Singapore
16 h-index
85 publications
2.2K citations
Hitachi (Japan)
Tokyo, Japan
15 h-index
65 publications
1.7K citations
Chinese Academy of Sciences
Beijing, China
15 h-index
77 publications
2.2K citations
Commissariat à l'Énergie Atomique et aux Énergies Alternatives
Paris, France
14 h-index
95 publications
3.6K citations
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Venues
- Applied Physics Letters
188 publications · 7.8K citations
48
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- Journal of Applied Physics
149 publications · 5.9K citations
38
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- Japanese Journal of Applied Physics
JJAP · 64 publications · 1.7K citations
23
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- Applied Surface Science
42 publications · 1.2K citations
21
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- IEEE Electron Device Letters
31 publications · 1.3K citations
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