Optimization of the surface and structural quality of N-face InN grown by molecular beam epitaxy

Abstract

The authors demonstrate the impact of growth kinetics on the surface and structural properties of N-face InN grown by molecular beam epitaxy. Superior surface morphology with step-flow growth features is achieved consistently under In-rich conditions in a low-temperature region of 500–540°C. Remarkably, off-axis x-ray rocking curve (ω scans) widths are found to be independent of the growth conditions. The band gap determined from optical absorption measurements of optimized InN is 0.651eV, while photoluminescence peak emission occurs at even lower energies of ∼0.626eV. Hall measurements show room temperature peak electron mobilities as high as 2370cm2∕Vs at a carrier concentration in the low 1017cm−3 region. Analysis of the thickness dependence of the carrier concentration demonstrates a n-type surface accumulation layer with a sheet carrier concentration of ∼3×1013cm−2.