Studies on optical and dielectric properties of Al2O3 thin films prepared by electron beam evaporation and spray pyrolysis method

Determination of the thickness and optical constants of amorphous silicon

R. Swanepoel · Journal of Physics E Scientific Instruments · 1983 · 3.9K citations

Optical Materials, Engineering, Optic Design +17

Characteristics of Fast Surface States Associated with SiO[sub 2]-Si and Si[sub 3]N[sub 4]-SiO[sub 2]-Si Structures

B. E. Deal, E. L. MacKenna, P. L. Castro · Journal of The Electrochemical Society · 1969 · 149 citations

Materials Science, Engineering, Oxide Electronics +13

Epitaxial Al2O3 films on Si by low-pressure chemical vapor deposition

Mákoto Ishida, I. Katakabe, Tetsurō Nakamura et al. · Applied Physics Letters · 1988 · 137 citations

Aluminium Nitride, Engineering, Heteroepitaxial Al2o3 Films +16

Aluminum oxide thin films prepared by chemical vapor deposition from aluminum 2-ethylhexanoate

Toshiro Maruyama, T. NAKAI · Applied Physics Letters · 1991 · 128 citations

Materials Science, Materials Engineering, Chemical Engineering +11

Discharge characteristics for magnetron sputtering of Al in Ar and Ar/O2 mixtures

S. Maniv, W. D. Westwood · Journal of Vacuum Science and Technology · 1980 · 114 citations

Materials Science, Materials Engineering, Electrical Engineering +15