S. Maniv

Pressure and angle of incidence effects in reactive planar magnetron sputtered ZnO layers

S. Maniv, W. D. Westwood, Elena Colombini · Journal of Vacuum Science and Technology · 1982 · 199 citations

Incidence Effects, Engineering, Zno Layers +16

Discharge characteristics for magnetron sputtering of Al in Ar and Ar/O2 mixtures

S. Maniv, W. D. Westwood · Journal of Vacuum Science and Technology · 1980 · 114 citations

Materials Science, Materials Engineering, Electrical Engineering +15

Controlled texture of reactively rf-sputtered ZnO thin films

S. Maniv, Avigdor Zangvil · Journal of Applied Physics · 1978 · 110 citations

Materials Science, Surface Characterization, Material Analysis +13

The current-voltage characteristic of magnetron sputtering systems

W. D. Westwood, S. Maniv, P. J. Scanlon · Journal of Applied Physics · 1983 · 66 citations

Engineering, Glow Discharge, I-v Characteristic +16

Transparent conducting zinc oxide and indium–tin oxide films prepared by modified reactive planar magnetron sputtering

S. Maniv, C. J. Miner, W. D. Westwood · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1983 · 60 citations

Engineering, Zinc Oxide, Thin Film Process Technology +17