A 90-nm Low-Power 32-kB Embedded SRAM With Gate Leakage Suppression Circuit for Mobile Applications

Koji Nii, Yasumasa Tsukamoto, T. Yoshizawa, Susumu Imaoka, Y. Yamagami, Tetsuya Suzuki, A. Shibayama, Hiroshi Makino, Shuhei Iwade

IEEE Journal of Solid-State Circuits · 2004 · 83 citations · 11 references

Concepts

Abstract

In sub-100-nm generation, gate-tunneling leakage current increases and dominates the total standby leakage current of LSIs based on decreasing gate-oxide thickness. Showing that the gate leakage current is effectively reduced by lowering the gate voltage, we propose a local dc level control (LDLC) for SRAM cell arrays and an automatic gate leakage suppression driver (AGLSD) for peripheral circuits. We designed and fabricated a 32-kB 1-port SRAM using 90-nm CMOS technology. The six-transistor SRAM cell size is 1.25 /spl mu/m/sup 2/. Evaluation shows that the standby current of 32-kB SRAM is 1.2 /spl mu/A at 1.2 V and room temperature. It is reduced to 7.5% of conventional SRAM.

References

11