Concepedia

Effective baking of thick and ultra-thick photoresist layers by infrared radiation

M. Kubenz, Ute Ostrzinski, F. Reuther, G. Gruetzner

Microelectronic Engineering · 2003 · 15 citations · 2 references

DOI

Concepts

References

2

High-aspect-ratio, ultrathick, negative-tone near-UV photoresist and its applications for MEMS

H. Lorenz, M. Despont, N. Fahrni et al. · Sensors and Actuators A Physical · 1998 · 573 citations · Full text

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Fabrication of photoplastic high-aspect ratio microparts and micromolds using SU-8 UV resist

H. Lorenz, M. Despont, P. Vettiger et al. · Microsystem Technologies · 1998 · 149 citations · Full text

, , +8