Applied Physics Letters · 1994 · 32 citations · 16 references
Natural SciencesMaterials EngineeringMaterials ScienceNanotechnologySurface ChemistrySurface ScienceAtomic Force MicroscopyNanoscale MaterialsNanostructured SurfacesScanning Probe MicroscopySemiconductor SurfacesSurface PhysicsContact Mode Atomic Force MicroscopyLine WidthNoncontact Atomic Force MicroscopySiliconSilicon Surface ScienceSurface Topography MappingTip-sample AdhesionTip-sample Interactions
Nanometer structures were written on Si(100) surfaces by use of a non-contact-mode atomic force microscope. The silicon oxide was formed beneath the tip by applying a negative bias voltage between a p+ silicon tip and the samples. The writing resolution was mainly determined by the local chemical reactions induced by the tip and a minimum line width of about 10 nm was obtained, which is close to that achieved by scanning tunneling microscope and contact-mode atomic force microscope writing.
16
Nanometer-scale lithography using the atomic force microscope
Arun Majumdar, P. I. Oden, J. P. Carrejo et al. · Applied Physics Letters · 1992 · 191 citations
Natural Sciences, Materials Engineering, Materials Science +13