Nanometer-scale lithography using the atomic force microscope

Abstract

We demonstrate a new use of the atomic force microscope (AFM) for nanometer-scale lithography on ultrathin films of poly(methylmethacrylate) (PMMA). The PMMA films were chemically modified as both positive and negative resists due to energy transfer from a highly localized electron source provided by metallized AFM tips. We were able to fabricate a line pattern with 68 nm line periodicity with about 35 nm line widths.