Plasma and injection modification of the gate dielectric in MOS structures

Anode hole injection and trapping in silicon dioxide

D. J. DiMaria, E. Cartier, D. A. Buchanan · Journal of Applied Physics · 1996 · 209 citations

Engineering, Electrical Engineering, Materials Science +17

Electron and hole trapping in doped oxides

W. L. Warren, M.R. Shaneyfelt, Daniel M. Fleetwood et al. · IEEE Transactions on Nuclear Science · 1995 · 34 citations

Natural Sciences, Materials Science, Physics +17

The effect of RF annealing upon electron-beam irradiated MIS structures

T.P. Ma · Solid-State Electronics · 1979 · 12 citations

Engineering, Electrical Engineering, Materials Science +12