Concepedia

Cycle of two-step etching process using ICP for diamond MEMS applications

Takatoshi Yamada, Hiromichi Yoshikawa, Hiroshi Uetsuka, Somu Kumaragurubaran, Norio Tokuda, Shinichi Shikata

Diamond and Related Materials · 2006 · 53 citations · 11 references

DOI

Concepts

References

11

Smooth and high-rate reactive ion etching of diamond

Yoshiki Nishibayashi, Koji Kobashi, Takashi Hirao et al. · Diamond and Related Materials · 2002 · 137 citations · Full text

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Plasma etching of organic materials. I. Polyimide in O2–CF4

Frank D. Egitto, F. Emmi, R. S. Horwath et al. · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 1985 · 132 citations

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Reactive Ion Etching of Diamond in O<sub>2</sub> and CF<sub>4</sub> Plasma, and Fabrication of Porous Diamond for Field Emitter Cathodes

Hiromu Shiomi · Japanese Journal of Applied Physics · 1997 · 118 citations

, , +14

New etching process for device fabrication using diamond

Doo-Sup Hwang, T. Saito, Naoji Fujimori · Diamond and Related Materials · 2004 · 70 citations

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Micromachining of CVD diamond by RIE for MEMS applications

Guifu Ding, Hongyan Mao, Yihong Zhang et al. · Diamond and Related Materials · 2005 · 55 citations

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