Characterization and control of defect states of polycrystalline silicon thin film transistor fabricated by laser crystallization

Formation kinetics and control of microcrystallite in μc-Si:H from glow discharge plasma

Akihisa Matsuda · Journal of Non-Crystalline Solids · 1983 · 646 citations

Natural Sciences, Materials Engineering, Materials Science +14

XeCl Excimer laser annealing used in the fabrication of poly-Si TFT's

Toshiyuki Sameshima, M. Sekiya · IEEE Electron Device Letters · 1986 · 444 citations

Engineering, Electrical Engineering, Materials Science +16

XeCl Excimer Laser Annealing used in the Fabrication of Poly-Si TFTs

Toshiyuki Sameshima, M. Sekiya, S. Usui · 1985 · 354 citations

Engineering, Materials Engineering, Materials Science +13

High-performance TFTs fabricated by XeCl excimer laser annealing of hydrogenated amorphous-silicon film

K. Sera, Fujio Okumura, Hiroyuki Uchida et al. · IEEE Transactions on Electron Devices · 1989 · 280 citations

Engineering, Electrical Engineering, Materials Science +17

High performance poly-Si TFTs fabricated using pulsed laser annealing and remote plasma CVD with low temperature processing

A Kohno, Toshiyuki Sameshima, Naoki Sano et al. · IEEE Transactions on Electron Devices · 1995 · 154 citations

Engineering, Electrical Engineering, Physics +17