Formation kinetics and control of microcrystallite in μc-Si:H from glow discharge plasma

The preparation of thin layers of Ge and Si by chemical hydrogen plasma transport

S. Vepřek, V. Mareček · Solid-State Electronics · 1968 · 283 citations

Materials Science, Thin Layers, Engineering +8

Plasma spectroscopy—Glow discharge deposition of hydrogenated amorphous silicon

Akihisa Matsuda, Kazunobu Tanaka · Thin Solid Films · 1982 · 198 citations

Engineering, Glow Discharge, Applied Physics +4

Electrical and Structural Properties of Phosphorous-Doped Glow-Discharge Si:F:H and Si:H Films

Akihisa Matsuda, Satoshi Yamasaki, Katsumi Nakagawa et al. · Japanese Journal of Applied Physics · 1980 · 195 citations

Engineering, Glow Discharge, Phosphorous-doped Glow-discharge Si +17

Properties of heavily doped GDSi with low resistivity

S. Usui, Masanori Kikuchi · Journal of Non-Crystalline Solids · 1979 · 133 citations

Low-temperature crystallization of doped <i>a</i>-Si:H alloys

Toshihiko Hamasaki, Hiroyuki Kurata, M. Hirose et al. · Applied Physics Letters · 1980 · 129 citations

Optical Materials, Engineering, Low-temperature Crystallization +17