Toshihiko Hamasaki

Low-temperature crystallization of doped <i>a</i>-Si:H alloys

Toshihiko Hamasaki, Hiroyuki Kurata, M. Hirose et al. · Applied Physics Letters · 1980 · 129 citations

Optical Materials, Engineering, Low-temperature Crystallization +17

High-rate deposition of amorphous hydrogenated silicon from a SiH4 plasma

Toshihiko Hamasaki, Mikito Ueda, Akiyoshi Chayahara et al. · Applied Physics Letters · 1984 · 66 citations

Materials Science, Materials Engineering, Semiconductor Technology +14

Novel effects of magnetic field on the silane glow discharge

M. Taniguchi, M. Hirose, Toshihiko Hamasaki et al. · Applied Physics Letters · 1980 · 59 citations

Optical Materials, Engineering, Glow Discharge +16

Nucleation of Microcrystallites in Phosphorus-Doped Si:H Films

Yasuyoshi Mishima, Toshihiko Hamasaki, Hiroyuki Kurata et al. · Japanese Journal of Applied Physics · 1981 · 33 citations

Materials Science, Semiconductors, Optical Materials +13

New mode of plasma deposition in a capacitively coupled reactor

Toshihiko Hamasaki, Mikito Ueda, Akiyoshi Chayahara et al. · Applied Physics Letters · 1984 · 30 citations

Electrical Engineering, Chemical Engineering, New Technique +12