Applied Optics · 1995 · 52 citations · 16 references
Natural SciencesMaterials EngineeringMaterials ScienceOptical MaterialsOpticsPhotonicsDiffractionHolographyNonlinear OpticsPhysical OpticsThin Film Optical PropertiesWave ReflectionFilm-substrate InteractionLight Exposure ModelingPhotoresist DevelopmentPhotoresistsReflection HolographySurface Reflectance EffectsThin-film Interface Engineering
A simulation of the profile of holographically recorded structures in photoresists is performed. In addition to its simplicity this simulation can be used to take into account the effects that arise from exposure, photosensitization, development, and resolution of positive photoresists. We analyzed the effects of isotropy of wet development, nonlinearity of the photoresist response curve, background light, and standing waves produced by reflection at the film-substrate interface by using this simulation, and the results agree with the experimentally recorded profiles.
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Characterization of positive photoresist
F.H. Dill, W.P. Hornberger, P.S. Hauge et al. · IEEE Transactions on Electron Devices · 1975 · 422 citations
Natural Sciences, Materials Engineering, Optical Materials +9
W.G. Oldham, S.N. Nandgaonkar, Andrew R. Neureuther et al. · IEEE Transactions on Electron Devices · 1979 · 216 citations
Engineering, Computer Engineering, Electrical Engineering +15
Artificial distributed-index media fabricated by zero-order gratings
Wilhelm Stork, N. Streibl, H. Haidner et al. · Optics Letters · 1991 · 183 citations