Study of reactions between HfO2 and Si in thin films with precise identification of chemical states by XPS

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Hafnium and zirconium silicates for advanced gate dielectrics

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Ultrathin high-K metal oxides on silicon: processing, characterization and integration issues

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Effect of postdeposition annealing on the thermal stability and structural characteristics of sputtered HfO2 films on Si (100)

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HfO 2 / SiO 2 interface chemistry studied by synchrotron radiation x-ray photoelectron spectroscopy

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