Concepedia

Study of nitrogen-rich silicon oxynitride films obtained by PECVD

Denise Criado, I. Pereyra, M.I. Alayo

Materials Characterization · 2003 · 45 citations · 11 references

DOI

Concepts

References

11

Ultrathin (<4 nm) SiO2 and Si–O–N gate dielectric layers for silicon microelectronics: Understanding the processing, structure, and physical and electrical limits

M. L. Green, E. P. Gusev, R. Degraeve et al. · Journal of Applied Physics · 2001 · 772 citations

, , +17

On the nitrogen and oxygen incorporation in plasma-enhanced chemical vapor deposition (PECVD) SiOxNy films

M.I. Alayo, I. Pereyra, Wanderlã L. Scopel et al. · Thin Solid Films · 2002 · 157 citations

, , +14

Plasma enhanced chemical vapor deposition silicon oxynitride optimized for application in integrated optics

Kerstin Wörhoff, A. Driessen, P.V. Lambeck et al. · Sensors and Actuators A Physical · 1999 · 125 citations

, , +14

High quality low temperature DPECVD silicon dioxide

I. Pereyra, M.I. Alayo · Journal of Non-Crystalline Solids · 1997 · 66 citations

, , +7

Modification of refractive index in silicon oxynitride films during deposition

R. Machorro, E. C. Sámano, G. Soto et al. · Materials Letters · 2000 · 39 citations

, , +14