M.I. Alayo

On the nitrogen and oxygen incorporation in plasma-enhanced chemical vapor deposition (PECVD) SiOxNy films

M.I. Alayo, I. Pereyra, Wanderlã L. Scopel et al. · Thin Solid Films · 2002 · 156 citations

Materials Engineering, Engineering, Surface Science +9

Thick SiO x N y and SiO 2 films obtained by PECVD technique at low temperatures

M.I. Alayo, I. Pereyra, M.N.P. Carreño · Thin Solid Films · 1998 · 66 citations

Materials Science, Materials Engineering, Sio 2 +10

High quality low temperature DPECVD silicon dioxide

I. Pereyra, M.I. Alayo · Journal of Non-Crystalline Solids · 1997 · 65 citations

Materials Engineering, Engineering, Applied Physics +3

Study of nitrogen-rich silicon oxynitride films obtained by PECVD

Denise Criado, I. Pereyra, M.I. Alayo · Materials Characterization · 2003 · 45 citations

Materials Science, Materials Engineering, Engineering +5

Local structure and bonds of amorphous silicon oxynitride thin films

Wanderlã L. Scopel, Márcia Carvalho de Abreu Fantini, M.I. Alayo et al. · Thin Solid Films · 2002 · 44 citations

Materials Science, Engineering, Silicon On Insulator +6