Thick SiO x N y and SiO 2 films obtained by PECVD technique at low temperatures

Silica-based single-mode waveguides on silicon and their application to guided-wave optical interferometers

N. Takato, K. Jinguji, M. Yasu et al. · Journal of Lightwave Technology · 1988 · 232 citations

Engineering, Electrical Engineering, Materials Science +17

Optical properties of PECVD erbium-doped silicon-rich silica: evidence for energy transfer between silicon microclusters and erbium ions

Anthony J. Kenyon, P.F. Trwoga, M. Federighi et al. · Journal of Physics Condensed Matter · 1994 · 225 citations

Engineering, Materials Engineering, Materials Science +17

Plasma enhanced chemical vapor deposition: Differences between direct and remote plasma excitation

G. Lucovsky, D. V. Tsu · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1987 · 177 citations

Natural Sciences, Materials Engineering, Materials Science +15

High quality low temperature DPECVD silicon dioxide

I. Pereyra, M.I. Alayo · Journal of Non-Crystalline Solids · 1997 · 66 citations

Engineering, Materials Engineering, Materials Science +7

Atomic structure in SiO2 thin films deposited by remote plasma-enhanced chemical vapor deposition

G. Lucovsky, J. T. Fitch, D. V. Tsu et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1989 · 59 citations

Natural Sciences, Materials Science, Physics +17