Low-temperature Deposition
Low-Temperature Deposition is a thin-film deposition technique that enables the growth of high-quality films at temperatures significantly below conventional processing thresholds, thereby preserving thermal sensitivity of underlying substrates and enabling integration with temperature-constrained materials and devices.
1.5K
Publications
64.6K
Citations
6.4K
Authors
1.3K
Institutions
Publications per year
2017–2026
286
1.5K
1–5 of 1.5K
6.4K
13
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University of Illinois Urbana-Champaign, United States
11 publications · 494 citations
11
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10
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1–5 of 6.4K
1.3K

Centre National de la Recherche Scientifique
Paris, France
25 h-index
197 publications
8.2K citations

Chinese Academy of Sciences
Beijing, China
20 h-index
192 publications
9K citations
Seoul National University
Seoul, South Korea
20 h-index
98 publications
3.4K citations
North Carolina State University
Raleigh, United States
17 h-index
68 publications
3.8K citations
Tokyo Institute of Technology
Tokyo, Japan
17 h-index
78 publications
2.8K citations
Yonsei University
Seoul, South Korea
16 h-index
51 publications
2.2K citations
Massachusetts Institute of Technology
Cambridge, United States
15 h-index
52 publications
2.3K citations
The University of Texas at Dallas
Richardson, United States
15 h-index
71 publications
1.9K citations
1–8 of 1.3K
108 publications · 5.7K citations
45
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118 publications · 5K citations
39
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50 publications · 2.7K citations
32
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69 publications · 4.2K citations
30
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JES · 52 publications · 2.6K citations
30
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