Low-temperature Deposition

Low-Temperature Deposition is a thin-film deposition technique that enables the growth of high-quality films at temperatures significantly below conventional processing thresholds, thereby preserving thermal sensitivity of underlying substrates and enabling integration with temperature-constrained materials and devices.

1.5K

Publications

64.6K

Citations

6.4K

Authors

1.3K

Institutions

Publications per year

2017–2026

286

Authors

6.4K

  1. ML
    Markku Leskelä

    University of Helsinki, Finland

    15 publications · 878 citations

    13

    h-index

  2. MR
    Mikko Ritala

    University of Helsinki, Finland

    15 publications · 1.1K citations

    13

    h-index

  3. GN
    Gregory N. Parsons

    North Carolina State University, United States

    12 publications · 698 citations

    12

    h-index

  4. GS
    Gregory S. Girolami

    University of Illinois Urbana-Champaign, United States

    11 publications · 494 citations

    11

    h-index

  5. HF
    Hiroshi Funakubo

    Tokyo Institute of Technology, Japan

    11 publications · 388 citations

    10

    h-index

1–5 of 6.4K

Venues

  1. Applied Physics Letters

    108 publications · 5.7K citations

    45

    h-index

  2. Thin Solid Films

    118 publications · 5K citations

    39

    h-index

  3. Chemistry of Materials

    50 publications · 2.7K citations

    32

    h-index

  4. 30

    h-index

  5. Journal of The Electrochemical Society

    JES · 52 publications · 2.6K citations

    30

    h-index

1–5