D. V. Tsu

Local atomic structure in thin films of silicon nitride and silicon diimide produced by remote plasma-enhanced chemical-vapor deposition

D. V. Tsu, G. Lucovsky, M. J. Mantini · Physical review. B, Condensed matter · 1986 · 306 citations

Materials Science, Engineering, Physics +15

Effect of hydrogen dilution on the structure of amorphous silicon alloys

D. V. Tsu, B. S. Chao, Stanford R. Ovshinsky et al. · Applied Physics Letters · 1997 · 253 citations

Materials Science, Materials Engineering, Engineering +13

Deposition of silicon dioxide and silicon nitride by remote plasma enhanced chemical vapor deposition

G. Lucovsky, P. D. Richard, D. V. Tsu et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1986 · 237 citations

Engineering, Thin Film Process Technology, Chemistry +16

Local bonding environments of Si–OH groups in SiO2 deposited by remote plasma-enhanced chemical vapor deposition and incorporated by postdeposition exposure to water vapor

Jeremy Theil, D. V. Tsu, M. W. Watkins et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1990 · 178 citations

Optical Materials, Engineering, Water Vapor +16

Plasma enhanced chemical vapor deposition: Differences between direct and remote plasma excitation

G. Lucovsky, D. V. Tsu · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1987 · 176 citations

Engineering, Plasma Physics, Silicon Oxide +16