Concepedia

Dry oxidation of MBE-SiGe films: rate enhancement, Ge redistribution and defect injection

M. Spadafora, A. Terrasi, S. Mirabella, A. M. Piro, M.G. Grimaldi, Silvia Scalese, E. Napolitani, M. Di Marino, D. De Salvador, A. Carnera

Materials Science in Semiconductor Processing · 2004 · 11 citations · 12 references

DOI

Concepts

References

12

<i>Electron Energy-Loss Spectroscopy in the Electron Microscope</i>

R.F. Egerton, Dale E. Newbury · Physics Today · 1987 · 3.4K citations

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Thermal Oxidation of Silicon in Dry Oxygen Growth‐Rate Enhancement in the Thin Regime: I . Experimental Results

Hisham Z. Massoud, J.D. Plummer, E. A. Irene · Journal of The Electrochemical Society · 1985 · 318 citations

, , +17

Carbon incorporation in silicon for suppressing interstitial-enhanced boron diffusion

P.A. Stolk, D. J. Eaglesham, H.‐J. Gossmann et al. · Applied Physics Letters · 1995 · 201 citations

, , +17

Novel oxidation process in Ge+-implanted Si and its effect on oxidation kinetics

O. W. Holland, C. W. White, D. Fathy · Applied Physics Letters · 1987 · 109 citations

, , +17

Interaction between self-interstitials and substitutional C in silicon: Interstitial trapping and C clustering mechanism

S. Mirabella, Alessandro Coati, D. De Salvador et al. · Physical review. B, Condensed matter · 2002 · 91 citations

, , +15