Phosphorus redistribution in the surface region of heavily phosphorus doped silicon

Low Temperature Surface Cleaning of Silicon and Its Application to Silicon MBE

Akitoshi Ishizaka, Y. Shiraki · Journal of The Electrochemical Society · 1986 · 1.6K citations

Engineering, Materials Engineering, Materials Science +17

The formation of hydrogen passivated silicon single-crystal surfaces using ultraviolet cleaning and HF etching

Takayuki Takahagi, Ichiro Nagai, A. Ishitani et al. · Journal of Applied Physics · 1988 · 495 citations

Engineering, Materials Engineering, Materials Science +17

SiSiO2 interface characterization by ESCA

Akitoshi Ishizaka, Seiichi Iwata, Yoshiaki Kamigaki · Surface Science · 1979 · 175 citations

Natural Sciences, Materials Science, Interface Science +7

Observation of phosphorus pile-up at the SiO2-Si interface

J. S. Johannessen, W. E. Spicer, J. F. Gibbons et al. · Journal of Applied Physics · 1978 · 63 citations

Engineering, Electrical Engineering, Materials Science +17

High resolution x-ray photoemission spectroscopy studies of thin SiO2 and Si/SiO2 interfaces

Takeo Hattori · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1993 · 36 citations

Natural Sciences, Materials Engineering, Materials Science +16