Concepedia

Electrical and reliability characteristics of HfO2 gate dielectric treated in N2 and NH3 plasma atmosphere

Jeon-Ho Kim, Kyu-Jeong Choi, Soon‐Gil Yoon

Applied Surface Science · 2004 · 24 citations · 5 references

DOI

Concepts

References

5

Hafnium and zirconium silicates for advanced gate dielectrics

G. D. Wilk, Robert M. Wallace, J. Anthony · Journal of Applied Physics · 2000 · 972 citations

, , +17

Electrical properties of hafnium silicate gate dielectrics deposited directly on silicon

G. D. Wilk, Robert M. Wallace · Applied Physics Letters · 1999 · 504 citations

, , +17

Stable zirconium silicate gate dielectrics deposited directly on silicon

G. D. Wilk, Robert M. Wallace · Applied Physics Letters · 2000 · 327 citations

, , +17

Bonding states and electrical properties of ultrathin HfOxNy gate dielectrics

Chang Seok Kang, Hag-Ju Cho, Katsunori Onishi et al. · Applied Physics Letters · 2002 · 162 citations

, , +17

Characteristics of TaO<sub>x</sub>N<sub>y</sub> Gate Dielectric with Improved Thermal Stability

Heung-Jae Cho, Dae-Gyu Park, In‐Seok Yeo et al. · Japanese Journal of Applied Physics · 2001 · 26 citations

, , +17