Concepedia

Subresolution Assist Features

Subresolution Assist Features is a computational photomask design technique in semiconductor lithography that enhances patterning resolution by incorporating non-printing geometric elements on the mask to improve the imaging fidelity of primary features without being resolved on the wafer.

47

Publications

1.1K

Citations

222

Authors

43

Institutions

Publications per year

2017–2026

9

Variants

SrafSrafs

Parents

Publications

47

Fast inverse lithography technology

Daniel S. Abrams, Linyong Pang · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2006 · 98 citations

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<title>Automated optical proximity correction: a rules-based approach</title>

O.W. Otto, Joseph G. Garofalo, Kevin Low et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1994 · 81 citations

, , +14

Double pattern EDA solutions for 32nm HP and beyond

George E. Bailey, Alexander Tritchkov, Jea-Woo Park et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2007 · 78 citations

, , +12

Process optimization through model based SRAF printing prediction

Ramya Viswanathan, Jaione Tirapu-Azpiroz, Punitha Selvam · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2012 · 46 citations

, , +12

Resolution enhancement techniques in optical lithography: It's not just a mask problem

Lars W. Liebmann · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2001 · 44 citations

, , +12

1–5 of 47

Authors

222

  1. LW
    Lars W. Liebmann

    IBM (United States), United States

    5 publications · 124 citations

    5

    h-index

  2. DZ
    David Z. Pan

    The University of Texas at Austin, United States

    4 publications · 104 citations

    4

    h-index

  3. AT
    Alexander Tritchkov

    Mentor Technologies, United States

    4 publications · 126 citations

    4

    h-index

  4. CK
    Chikaaki Kodama

    Toshiba (Japan), Japan

    3 publications · 77 citations

    3

    h-index

  5. XM
    Xu Ma

    Beijing Institute of Technology, China

    3 publications · 66 citations

    3

    h-index

1–5 of 222

Institutions

43

  1. IMEC

    Leuven, Belgium

    5 h-index

    15 publications

    473 citations

  2. Texas Instruments (United States)

    Dallas, United States

    4 h-index

    9 publications

    99 citations

  3. The University of Texas at Austin

    Austin, United States

    4 h-index

    14 publications

    350 citations

  4. University of California San Diego

    San Diego, United States

    3 h-index

    5 publications

    90 citations

  5. Luminex (United States)

    Austin, United States

    3 h-index

    11 publications

    430 citations

  6. Beijing Institute of Technology

    Beijing, China

    3 h-index

    9 publications

    187 citations

  7. University of Delaware

    Newark, United States

    3 h-index

    3 publications

    66 citations

  8. Toshiba (Japan)

    Tokyo, Japan

    3 h-index

    10 publications

    278 citations

1–8 of 43

Venues

  1. 16

    h-index

  2. 4

    h-index

  3. 2

    h-index

  4. 1

    h-index

  5. Applied Optics

    1 publications · 15 citations

    1

    h-index

1–5