Concepedia

Step-and-repeat Lithography

Step-And-Repeat Lithography is a photolithographic patterning technique in which a mask pattern is sequentially transferred across discrete substrate fields through repeated alignment and exposure steps, distinguishing it from full-wafer or continuous scanning methods by its localized, field-by-field replication approach.

64

Publications

1.9K

Citations

315

Authors

90

Institutions

Publications per year

2017–2026

2

Variants

Stepper Lithography

Parents

Publications

64

Degradable Cross-Linkers and Strippable Imaging Materials for Step-and-Flash Imprint Lithography

William H. Heath, Frank L. Palmieri, Jacob R. Adams et al. · Macromolecules · 2008 · 130 citations

, , +17

A Novel Bioinspired Continuous Unidirectional Liquid Spreading Surface Structure from the Peristome Surface of <i>Nepenthes alata</i>

Huawei Chen, Liwen Zhang, Pengfei Zhang et al. · Small · 2016 · 126 citations · Full text

, , +9

Template fabrication schemes for step and flash imprint lithography

T. C. Bailey, Douglas J. Resnick, David P. Mancini et al. · Microelectronic Engineering · 2002 · 106 citations

, , +12

Design of orientation stages for step and flash imprint lithography

Byung Jin Choi, S. V. Sreenivasan, Stephen Johnson et al. · Precision Engineering · 2001 · 106 citations

, , +10

Printing, molding, and near-field photolithographic methods for patterning organic lasers, smart pixels and simple circuits

John A. Rogers, Zhenan Bao, M. Meier et al. · Synthetic Metals · 2000 · 74 citations

, , +17

1–5 of 64

Authors

315

  1. JH
    John H. Bruning

    AT&T (United States), United States

    4 publications · 62 citations

    4

    h-index

  2. DJ
    Douglas J. Resnick

    Motorola (United States), United States

    4 publications · 186 citations

    4

    h-index

  3. WJ
    William J. Dauksher

    Motorola (United States), United States

    3 publications · 154 citations

    3

    h-index

  4. KJ
    Kevin J. Nordquist

    Motorola (United States), United States

    3 publications · 154 citations

    3

    h-index

  5. SV
    S. V. Sreenivasan

    The University of Texas at Austin, United States

    3 publications · 157 citations

    3

    h-index

1–5 of 315

Institutions

90

  1. Motorola (United States)

    Schaumburg, United States

    4 h-index

    17 publications

    1.1K citations

  2. The University of Texas at Austin

    Austin, United States

    4 h-index

    32 publications

    3K citations

  3. FH Aachen

    Aachen, Germany

    3 h-index

    3 publications

    74 citations

  4. National Institute of Advanced Industrial Science and Technology

    Tsukuba, Japan

    3 h-index

    6 publications

    142 citations

  5. Mitsubishi Electric (Germany)

    Ratingen, Germany

    2 h-index

    3 publications

    132 citations

  6. Hewlett-Packard (United States)

    Palo Alto, United States

    2 h-index

    20 publications

    1.2K citations

  7. Lawrence Berkeley National Laboratory

    Berkeley, United States

    2 h-index

    10 publications

    415 citations

  8. Technische Universität Ilmenau

    Ilmenau, Germany

    2 h-index

    22 publications

    578 citations

1–8 of 90

Venues

  1. 12

    h-index

  2. Microelectronic Engineering

    8 publications · 270 citations

    8

    h-index

  3. Japanese Journal of Applied Physics

    JJAP · 5 publications · 139 citations

    5

    h-index

  4. IEEE Transactions on Electron Devices

    4 publications · 65 citations

    4

    h-index

  5. Journal of Vacuum Science and Technology

    2 publications · 44 citations

    2

    h-index

1–5