Selective Etch Stop Layers
Selective Etch Stop Layers is a micromachining technique that serves as a selectively resistant thin-film material engineered to halt specific etching processes at predetermined depths while allowing continued removal of surrounding structural layers in bulk micromachined microelectromechanical systems.
21
Publications
591
Citations
76
Authors
23
Institutions
Publications per year
2017–2026
2
Variants
Selective Etch-stop Layers
Parents
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Massachusetts Institute of Technology
Cambridge, United States
3 h-index
6 publications
132 citations

United States Naval Research Laboratory
Washington, United States
2 h-index
12 publications
390 citations
AT&T (United States)
Bedminster, United States
2 h-index
12 publications
287 citations

Uppsala University
Uppsala, Sweden
2 h-index
3 publications
168 citations

Varian Medical Systems (United States)
Palo Alto, United States
2 h-index
6 publications
126 citations

Pennsylvania State University
State College, United States
1 h-index
2 publications
22 citations
Naval Research Laboratory Electronics Science and Technology Division
Washington, United States
1 h-index
6 publications
102 citations
IBM (United States)
Armonk, United States
1 h-index
3 publications
93 citations
1–8 of 23
4 publications · 116 citations
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JES · 4 publications · 75 citations
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3 publications · 67 citations
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JMM · 2 publications · 138 citations
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JEM · 1 publications · 11 citations
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