Projection Lithography

Projection Lithography is a photolithographic technique in semiconductor manufacturing that belongs to the class of pattern transfer methods, distinguished by its use of an optical projection system to selectively expose a photosensitive resist layer through a mask, thereby replicating microscopic circuit patterns onto a substrate with high resolution and precision.

304

Publications

10.6K

Citations

1.2K

Authors

223

Institutions

Publications per year

2017–2026

29

Variants

Projection Printing

Authors

1.2K

  1. GS
    G. Stengl

    IMS Nanofabrication (Austria), Austria

    15 publications · 236 citations

    12

    h-index

  2. WK
    W. K. Waskiewicz

    AT&T (United States), United States

    17 publications · 289 citations

    12

    h-index

  3. DL
    David L. Windt

    Reflective X Ray Optics, United States

    11 publications · 192 citations

    11

    h-index

  4. HL
    H. Löschner

    IMS Nanofabrication (Austria), Austria

    12 publications · 169 citations

    10

    h-index

  5. JA
    J. Alexander Liddle

    Lawrence Berkeley National Laboratory, United States

    10 publications · 226 citations

    10

    h-index

1–5 of 1.2K

Venues

  1. 23

    h-index

  2. 20

    h-index

  3. Applied Optics

    20 publications · 597 citations

    15

    h-index

  4. Microelectronic Engineering

    16 publications · 337 citations

    12

    h-index

  5. IEEE Transactions on Electron Devices

    9 publications · 562 citations

    9

    h-index

1–5