Concepedia

Process Window Development

Process Window Development is a methodological framework within atomic layer deposition that defines the systematic determination and optimization of operational parameters to achieve reproducible, high-quality thin film growth within specified bounds of temperature, pressure, and precursor exposure.

291

Publications

8.7K

Citations

1.4K

Authors

312

Institutions

Publications per year

2017–2026

98

Parents

Publications

291

Comparison of transformation to low-resistivity phase and agglomeration of TiSi/sub 2/ and CoSi/sub 2/

J. B. Lasky, James Nakos, O.J. Cain et al. · IEEE Transactions on Electron Devices · 1991 · 346 citations

, , +17

Process window enhancement for single point incremental forming through multi-step toolpaths

Joost R. Duflou, Johan Verbert, Bachir Belkassem et al. · CIRP Annals · 2008 · 215 citations · Full text

, , +13

High quality baseline for high efficiency, Cu(In<sub>1−x</sub>,Ga<sub>x</sub>)Se<sub>2</sub> solar cells

Philip Jackson, R. Würz, Uwe Rau et al. · Progress in Photovoltaics Research and Applications · 2007 · 180 citations · Full text

, , +17

A predictive approach to CVD of crystalline layers of TMDs: the case of MoS<sub>2</sub>

Vikram Kumar, Sukanya Dhar, Tanushree H. Choudhury et al. · Nanoscale · 2015 · 147 citations

, , +17

On the effect of process parameters on properties of AlSi10Mg parts produced by DMLS

Manickavasagam Krishnan, Eleonora Atzeni, Riccardo Canali et al. · Rapid Prototyping Journal · 2014 · 128 citations

, , +15

1–5 of 291

Authors

1.4K

  1. LP
    Linyong Pang

    Luminex (United States), United States

    5 publications · 138 citations

    5

    h-index

  2. RS
    Robert Socha

    ASML (Netherlands), Netherlands

    5 publications · 143 citations

    5

    h-index

  3. CK
    Carolin Körner

    Friedrich-Alexander-Universität Erlangen-Nürnberg, Germany

    4 publications · 181 citations

    4

    h-index

  4. MM
    Matthias Markl

    Friedrich-Alexander-Universität Erlangen-Nürnberg, Germany

    4 publications · 181 citations

    4

    h-index

  5. JW
    James W. Thackeray

    Dow Chemical (United States), United States

    4 publications · 89 citations

    4

    h-index

1–5 of 1.4K

Institutions

312

  1. IBM (United States)

    Armonk, United States

    12 h-index

    89 publications

    3.6K citations

  2. IMEC

    Leuven, Belgium

    11 h-index

    110 publications

    2.2K citations

  3. Friedrich-Alexander-Universität Erlangen-Nürnberg

    Erlangen, Germany

    10 h-index

    28 publications

    1.1K citations

  4. ASML (Netherlands)

    Veldhoven, The Netherlands

    9 h-index

    36 publications

    678 citations

  5. RWTH Aachen University

    Aachen, Germany

    8 h-index

    23 publications

    598 citations

  6. GlobalFoundries (United States)

    Santa Clara, United States

    8 h-index

    23 publications

    411 citations

  7. IBM Research - Thomas J. Watson Research Center

    Yorktown Heights, United States

    6 h-index

    16 publications

    429 citations

  8. Commissariat à l'Énergie Atomique et aux Énergies Alternatives

    Paris, France

    6 h-index

    25 publications

    372 citations

1–8 of 312

Venues

  1. 18

    h-index

  2. Journal of Micro/Nanolithography MEMS and MOEMS

    10 publications · 246 citations

    10

    h-index

  3. Materials

    8 publications · 234 citations

    10

    h-index

  4. 8

    h-index

  5. Applied Physics Letters

    6 publications · 217 citations

    6

    h-index

1–5