Process Control Metrology
Process Control Metrology is a metrological framework within microfabrication that systematically characterizes and monitors manufacturing variations during production to ensure process stability and device conformity through real-time measurement and feedback.
62
Publications
2.1K
Citations
247
Authors
66
Institutions
Publications per year
2017–2026
6
Parents
62
Virtual metrology: a solution for wafer to wafer advanced process control
P. T. Chen, S.Y. Wu, Junshien Lin et al. · 2005 · 99 citations
Engineering, Industrial Engineering, Manufacturing Engineering +10
1–5 of 62
247
4
h-index
2
h-index
2
h-index
National Institute of Standards and Technology, United States
2 publications · 40 citations
2
h-index
2
h-index
1–5 of 247
66
National Cheng Kung University
Tainan City, Taiwan
3 h-index
11 publications
202 citations
Far East University
Tainan City, Taiwan
3 h-index
3 publications
90 citations
FZI Research Center for Information Technology
Karlsruhe, Germany
2 h-index
3 publications
48 citations
ASML (Netherlands)
Veldhoven, The Netherlands
2 h-index
26 publications
521 citations
National Institute of Standards and Technology
Gaithersburg, United States
2 h-index
4 publications
246 citations
Tokyo Electron (Japan)
Tokyo, Japan
2 h-index
2 publications
32 citations
Taiwan Semiconductor Manufacturing Company (Taiwan)
Hsinchu, Taiwan
2 h-index
16 publications
960 citations

National Yang Ming Chiao Tung University
Hsinchu, Taiwan
1 h-index
2 publications
122 citations
1–8 of 66
6 publications · 109 citations
6
h-index
4 publications · 96 citations
4
h-index
4 publications · 124 citations
4
h-index
3 publications · 63 citations
3
h-index
CRO · 2 publications · 147 citations
2
h-index
1–5