Concepedia

Overetch Control

Overetch Control is a process-level methodology in bulk micromachining that governs the extent of unintended material removal during wet etching by precisely managing etchant concentration, temperature, and duration to minimize dimensional deviations from the intended structural design.

4

Publications

144

Citations

16

Authors

3

Institutions

Publications per year

2017–2026

0

Parents

Publications

4

Experimental Investigation of the Impact of LWR on Sub-100-nm Device Performance

Hae‐Won Kim, Jeong Yong Lee, J. Shin et al. · IEEE Transactions on Electron Devices · 2004 · 90 citations

, , +16

Transient fluorocarbon film thickness effects near the silicon dioxide/silicon interface in selective silicon dioxide reactive ion etching

M. Jaso, G. S. Oehrlein · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1988 · 23 citations

, , +16

Active neutral network control of wafer attributes in a plasma etch process

Edward A. Rietman, R.C. Frye, Earl R. Lory et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1993 · 17 citations

, , +17

A process for improved Al(Cu) reactive ion etching

C.‐K. Hu, B. Canney, D.J. Pearson et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1989 · 14 citations

, , +14

1–4 of 4

Authors

16

  1. SG
    Sang Gyun Woo

    Samsung (South Korea), South Korea

    1 publications · 90 citations

    1

    h-index

  2. CH
    C.‐K. Hu

    IBM Research - Thomas J. Watson Research Center, United States

    1 publications · 14 citations

    1

    h-index

  3. RF
    R.C. Frye

    AT&T (United States), United States

    1 publications · 17 citations

    1

    h-index

  4. BC
    B. Canney

    IBM Research - Thomas J. Watson Research Center, United States

    1 publications · 14 citations

    1

    h-index

  5. DP
    D.J. Pearson

    IBM Research - Thomas J. Watson Research Center, United States

    1 publications · 14 citations

    1

    h-index

1–5 of 16

Institutions

3

  1. IBM Research - Thomas J. Watson Research Center

    Yorktown Heights, United States

    2 h-index

    6 publications

    102 citations

  2. AT&T (United States)

    Bedminster, United States

    1 h-index

    4 publications

    68 citations

  3. Samsung (South Korea)

    Seoul, South Korea

    1 h-index

    6 publications

    540 citations

1–3 of 3

Venues

  1. 2

    h-index

  2. 1

    h-index

  3. IEEE Transactions on Electron Devices

    1 publications · 90 citations

    1

    h-index

1–3