Concepedia

Micromasking

Micromasking is a thin film etching phenomenon in which microscopic particles or residues act as localized masks during plasma etching, thereby preventing selective removal of underlying material and leading to surface roughness or feature distortions.

27

Publications

911

Citations

113

Authors

55

Institutions

Publications per year

2017–2026

7

Parents

Publications

27

An atomistic introduction to anisotropic etching

Miguel A. Gosálvez, K. Satō, Adam S. Foster et al. · Journal of Micromechanics and Microengineering · 2007 · 116 citations

, , +17

Fabrication of Novel MEMS Microgrippers by Deep Reactive Ion Etching With Metal Hard Mask

Alvise Bagolini, S. Ronchin, P. Bellutti et al. · Journal of Microelectromechanical Systems · 2017 · 79 citations

, , +17

Micropyramidal hillocks on KOH etched {100} silicon surfaces: formation, prevention and removal

H. Schröder, A. Steckenborn · Journal of Micromechanics and Microengineering · 1999 · 78 citations

, , +14

Residue-free reactive ion etching of β-SiC in CHF3/O2 with H2 additive

A. J. Steckl, P. H. Yih · Applied Physics Letters · 1992 · 56 citations

, , +17

Smooth etching of single crystal 6H-SiC in an electron cyclotron resonance plasma reactor

J. R. Flemish, Kelvin Y. Xie, J.H. Zhao · Applied Physics Letters · 1994 · 55 citations

, , +15

1–5 of 27

Authors

113

  1. YY
    Yunpeng Yin

    IBM (United States), United States

    2 publications · 38 citations

    2

    h-index

  2. AB
    Alvise Bagolini

    Fondazione Bruno Kessler, Italy

    2 publications · 101 citations

    2

    h-index

  3. HH
    Herbert H. Sawin

    Massachusetts Institute of Technology, United States

    2 publications · 38 citations

    2

    h-index

  4. PB
    P. Bellutti

    Fondazione Bruno Kessler, Italy

    2 publications · 101 citations

    2

    h-index

  5. SR
    S. Ronchin

    University of Trento, Italy

    1 publications · 79 citations

    1

    h-index

1–5 of 113

Institutions

55

  1. Massachusetts Institute of Technology

    Cambridge, United States

    2 h-index

    5 publications

    99 citations

  2. École Polytechnique Fédérale de Lausanne

    Lausanne, Switzerland

    2 h-index

    6 publications

    306 citations

  3. Fondazione Bruno Kessler

    Trento, Italy

    2 h-index

    6 publications

    360 citations

  4. SPTS Technologies (United Kingdom)

    Newport, United Kingdom

    1 h-index

    1 publications

    28 citations

  5. Singapore Science Park

    Singapore, Singapore

    1 h-index

    3 publications

    84 citations

  6. Soochow University

    Suzhou, China

    1 h-index

    7 publications

    98 citations

  7. STMicroelectronics (France)

    Montrouge, France

    1 h-index

    2 publications

    58 citations

  8. University of Science and Technology Beijing

    Beijing, China

    1 h-index

    3 publications

    45 citations

1–8 of 55

Venues

  1. Journal of Micromechanics and Microengineering

    JMM · 4 publications · 239 citations

    4

    h-index

  2. 4

    h-index

  3. 3

    h-index

  4. Journal of Applied Physics

    2 publications · 41 citations

    2

    h-index

  5. Applied Physics Letters

    2 publications · 111 citations

    2

    h-index

1–5