J. R. Flemish

A high-current and high-temperature 6H-SiC thyristor

Kelvin Y. Xie, J.H. Zhao, J. R. Flemish et al. · IEEE Electron Device Letters · 1996 · 58 citations

Engineering, Electrical Engineering, Materials Science +17

Smooth etching of single crystal 6H-SiC in an electron cyclotron resonance plasma reactor

J. R. Flemish, Kelvin Y. Xie, J.H. Zhao · Applied Physics Letters · 1994 · 55 citations

Engineering, Materials Engineering, Materials Science +15

Low damage and residue-free dry etching of 6H–SiC using electron cyclotron resonance plasma

Kelvin Y. Xie, J. R. Flemish, J.H. Zhao et al. · Applied Physics Letters · 1995 · 48 citations

Engineering, Electrical Engineering, Materials Science +17

High etch rates of SiC in magnetron enhanced SF6 plasmas

G. F. McLane, J. R. Flemish · Applied Physics Letters · 1996 · 44 citations

Natural Sciences, Materials Engineering, Materials Science +15

Raman study of low growth temperature GaAs

T. A. Gant, H. Shen, J. R. Flemish et al. · Applied Physics Letters · 1992 · 38 citations

Natural Sciences, Materials Science, Physics +17