G. F. McLane

Carbon nanotube tipped atomic force microscopy for measurement of <100 nm etch morphology on semiconductors

Gyula Nagy, M. Levy, R. Scarmozzino et al. · Applied Physics Letters · 1998 · 76 citations

Atomic Force Microscopy, Engineering, Microscopy +19

High etch rates of GaN with magnetron reactive ion etching in BCl3 plasmas

G. F. McLane, L. M. Casas, S. J. Pearton et al. · Applied Physics Letters · 1995 · 62 citations

Materials Engineering, Bcl3 Plasmas, Electrical Engineering +15

Surface interaction of H and O2 on thin PbSe epitaxic films

G. F. McLane, J.N. Zemel · Thin Solid Films · 1971 · 50 citations

Materials Science, Ii-vi Semiconductor, Epitaxial Growth +7

High etch rates of SiC in magnetron enhanced SF6 plasmas

G. F. McLane, J. R. Flemish · Applied Physics Letters · 1996 · 44 citations

Materials Science, Electrical Engineering, Engineering +11

Dependence of lateral oxidation rate on thickness of AlAs layer of interest as a current aperture in vertical-cavity surface-emitting laser structures

Bikash Koley, M. Dagenais, R. Jin et al. · Journal of Applied Physics · 1998 · 26 citations

Materials Science, Photonics, Layer Thickness +15