A. Steckenborn - Concepedia

Author

A. Steckenborn

Technische Universität Berlin

Also Known As

A Steckenborn, A. Steckenborn, A. steckenborn, Arno Steckenborn

Publications

725

Citations

H-Index

Concepts

All Affiliations

Technische Universität Berlin Siemens (Germany)Fraunhofer Institute for Telecommunications, Heinrich Hertz Institute Deutsche Bundespost RWTH Aachen University

About

A. Steckenborn is an author at Technische Universität Berlin specializing in applied physics, engineering, and physics.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	11	12	656
2	Applied Physics	11	11	645
3	Business	1	1	29
4	Natural Sciences	1	1	94
5	Biomedical Engineering	1	1	15

A. Steckenborn

Publications

704

Citations

H-Index

Page 1

	Year	Citations
Determination of Young's moduli of micromechanical thin films using the resonance method Laura Kiesewetter, J.-M. Zhang, D. Houdeau, Sensors and Actuators A Physical Materials ScienceEngineeringMicromechanicsMicrofabricationMechanical Engineering	1992	163
Localization induced electron-hole transition rate enhancement in GaAs quantum wells J. Christen, D. Bimberg, A. Steckenborn, Applied Physics Letters SemiconductorsPhotonicsQuantum SciencePhotoluminescenceEngineering	1984	121
Kinetics of relaxation and recombination of nonequilibrium carriers in GaAs: Carrier capture by impurities D. Bimberg, H. Münzel, A. Steckenborn, Physical review. B, Condensed matter SemiconductorsElectronic Excited StatePhotoluminescenceEngineeringPhysics	1985	94
Micropyramidal hillocks on KOH etched {100} silicon surfaces: formation, prevention and removal H. Schröder, A. Steckenborn Journal of Micromechanics and Microengineering EngineeringMicropyramidal HillocksSilicon On InsulatorChemical EngineeringBeam Lithography	1999	77
Injection, intersubband relaxation and recombination in GaAs multiple quantum wells D. Bimberg, J. Christen, A. Steckenborn, Journal of Luminescence Quantum ScienceEngineeringPhysicsQuantum DeviceApplied Physics	1985	68
Ion beam milling of InP with an Ar/O2-gas mixture W. Katzschner, A. Steckenborn, Ronny Löffler, Applied Physics Letters Materials ScienceElectrical EngineeringEtched ProfilesEngineeringElectron-beam Lithography	1984	35
Cathodoluminescence lifetime pattern of GaAs surfaces around dislocations A. Steckenborn, H. Münzel, D. Bimberg Journal of Luminescence PhotoluminescenceApplied PhysicsCompound SemiconductorCathodoluminescence Lifetime Pattern	1981	33
Development of an automated microreaction system with integrated sensorics for process screening and production Wolfgang Ferstl, S. Loebbecke, J. Antes, Chemical Engineering Journal EngineeringMicrofabricationIndustrial EngineeringMicroreaction SystemProcess Technology	2004	29
Effects of the etchmask properties on the anisotropy ratio in anisotropic etching of silicon in aqueous KOH H. Schröder, A. Steckenborn Journal of Micromechanics and Microengineering Materials EngineeringMaterials ScienceEtchmask PropertiesEngineeringMicrofabrication	1998	17
A chemical microanalysis system as a microfluid system demonstrator Martin Richter, A. Prak, J. Naundorf, EngineeringMicromachinesMicrofabricationAnalytical MicrosystemsPorous Media	1997	15

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