Concepedia

Mask Characterization

Mask Characterization is a scholarly contribution that constitutes a method, model, framework, theory, construct, dataset, task, or metric specifically advancing the analysis, interpretation, or evaluation of mask-related representations within the field of Mask Work.

17

Publications

484

Citations

66

Authors

19

Institutions

Publications per year

2017–2026

6

Parents

Publications

17

Polyaniline/Ti3C2Tx functionalized mask sensors for monitoring of CO2 and human respiration rate

Guodong Wu, Haishun Du, Kiandokht Pakravan et al. · Chemical Engineering Journal · 2023 · 64 citations

, , +12

Extreme Ultraviolet Lithography Development in the United States

Stefan Wurm · Japanese Journal of Applied Physics · 2007 · 53 citations

, , +14

Progress in EUV lithography toward manufacturing

Seong-Sue Kim, Roman Chalykh, Hoyeon Kim et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2017 · 48 citations

, , +11

Flexible film separation analysis of LCD based mask stereolithography

Xiangquan Wu, Chunjie Xu, Zhongming Zhang · Journal of Materials Processing Technology · 2020 · 42 citations

, , +13

Application of ultra-thin aluminum oxide etch mask made by atomic layer deposition technique

Kestutis Grigoras, Lauri Sainiemi, Jouni Tiilikainen et al. · Journal of Physics Conference Series · 2007 · 40 citations · Full text

, , +17

1–5 of 17

Authors

66

  1. CX
    Chunjie Xu

    Xi'an University of Technology, China

    2 publications · 82 citations

    2

    h-index

  2. YG
    Yuri Granik

    Mentor Technologies, United States

    2 publications · 36 citations

    2

    h-index

  3. ZZ
    Zhongming Zhang

    Huazhong Agricultural University, China

    2 publications · 82 citations

    2

    h-index

  4. XW
    Xiangquan Wu

    Xi’an University, China

    2 publications · 82 citations

    2

    h-index

  5. CP
    Chang-Min Park

    Samsung (South Korea), South Korea

    1 publications · 48 citations

    1

    h-index

1–5 of 66

Institutions

19

  1. IMEC

    Leuven, Belgium

    2 h-index

    6 publications

    162 citations

  2. Institute of New Materials

    Jinan, China

    2 h-index

    4 publications

    164 citations

  3. Xi’an University

    Xi'an, China

    2 h-index

    6 publications

    246 citations

  4. Mentor Technologies

    Tulsa, United States

    2 h-index

    5 publications

    89 citations

  5. Advanced Mask Technology Center (Germany)

    Dresden, Germany

    2 h-index

    2 publications

    21 citations

  6. ASML (Netherlands)

    Veldhoven, The Netherlands

    2 h-index

    3 publications

    85 citations

  7. Xi'an University of Technology

    Xi'an, China

    2 h-index

    6 publications

    246 citations

  8. Samsung (South Korea)

    Seoul, South Korea

    1 h-index

    17 publications

    816 citations

1–8 of 19

Venues

  1. 6

    h-index

  2. 3

    h-index

  3. Chemical Engineering Journal

    1 publications · 64 citations

    1

    h-index

  4. Japanese Journal of Applied Physics

    JJAP · 1 publications · 53 citations

    1

    h-index

  5. Huntington Library Quarterly

    1 publications · 29 citations

    1

    h-index

1–5