Line Patterning

Line Patterning is a lithographic fabrication technique within interconnect formation that defines the geometric arrangement of conductive pathways on a semiconductor substrate by selectively transferring a patterned resist mask onto an underlying thin film layer through etching or deposition processes.

103

Publications

3.5K

Citations

504

Authors

132

Institutions

Publications per year

2017–2026

12

Authors

504

  1. HO
    Hidenori Okuzaki

    University of Yamanashi, Japan

    4 publications · 320 citations

    4

    h-index

  2. YE
    Yasin Ekinci

    Paul Scherrer Institute, Switzerland

    4 publications · 179 citations

    4

    h-index

  3. AG
    Alan G. MacDiarmid

    University of Pennsylvania, United States

    3 publications · 303 citations

    3

    h-index

  4. RG
    Roel Gronheid

    IMEC, Belgium

    3 publications · 60 citations

    3

    h-index

  5. DM
    Dionysios Manessis

    Fraunhofer Institute for Reliability and Microintegration, Germany

    3 publications · 77 citations

    3

    h-index

1–5 of 504

Venues

  1. 14

    h-index

  2. Applied Physics Letters

    7 publications · 359 citations

    7

    h-index

  3. Microelectronic Engineering

    7 publications · 271 citations

    7

    h-index

  4. 3

    h-index

  5. Journal of Micromechanics and Microengineering

    JMM · 3 publications · 86 citations

    3

    h-index

1–5