A.E. Grigorescu

10nm lines and spaces written in HSQ, using electron beam lithography

A.E. Grigorescu, Marco C. van der Krogt, P. Kruit · Microelectronic Engineering · 2007 · 107 citations

Engineering, Electron-beam Lithography, Physics +9

Resist thickness effects on ultra thin HSQ patterning capabilities

Vadim Sidorkin, A.E. Grigorescu, H. Salemink et al. · Microelectronic Engineering · 2009 · 31 citations

Materials Engineering, Engineering, Electron-beam Lithography +8

Influence of the development process on ultimate resolution electron beam lithography, using ultrathin hydrogen silsesquioxane resist layers

A.E. Grigorescu, Marco C. van der Krogt, P. Kruit · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2007 · 25 citations

Materials Science, Electrical Engineering, Development Process +14

Sub-10-nm structures written in ultra-thin HSQ resist layers using electron-beam lithography

A.E. Grigorescu, Marco C. van der Krogt · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2007 · 17 citations

Hsq Resist, Electrical Engineering, Development Process +14

Towards 2–10nm electron-beam lithography: A quantitative approach

Vadim Sidorkin, A. van Run, Anja van Langen–Suurling et al. · Microelectronic Engineering · 2008 · 11 citations

Engineering, Electron-beam Lithography, Beam Lithography +4