Bilayer Resist Systems

Bilayer Resist Systems is a photolithographic resist architecture consisting of two distinct functional polymer layers—an upper imaging layer and a lower planarization or adhesion-promoting layer—that together enable high-resolution pattern transfer in thin film lithography by combining the etch resistance of a bottom layer with the sensitivity and resolution of a top imaging layer.

52

Publications

1.3K

Citations

237

Authors

62

Institutions

Publications per year

2017–2026

1

Publications

52

Authors

237

  1. GM
    Gregory M. Wallraff

    IBM Research - Almaden, United States

    4 publications · 58 citations

    4

    h-index

  2. MA
    Marie Angelopoulos

    IBM Research - Thomas J. Watson Research Center, United States

    3 publications · 58 citations

    3

    h-index

  3. PA
    Panagiotis Argitis

    National Centre of Scientific Research "Demokritos", Greece

    3 publications · 66 citations

    3

    h-index

  4. RS
    Recai Sezi

    Siemens (Germany), Germany

    3 publications · 45 citations

    3

    h-index

  5. RL
    R. Leuschner

    Siemens (Germany), Germany

    3 publications · 45 citations

    3

    h-index

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