Bilayer Resist Systems
Bilayer Resist Systems is a photolithographic resist architecture consisting of two distinct functional polymer layers—an upper imaging layer and a lower planarization or adhesion-promoting layer—that together enable high-resolution pattern transfer in thin film lithography by combining the etch resistance of a bottom layer with the sensitivity and resolution of a top imaging layer.
52
Publications
1.3K
Citations
237
Authors
62
Institutions
Publications per year
2017–2026
1
Parents
52
1–5 of 52
237
4
h-index
IBM Research - Thomas J. Watson Research Center, United States
3 publications · 58 citations
3
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National Centre of Scientific Research "Demokritos", Greece
3 publications · 66 citations
3
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3
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3
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1–5 of 237
62
IBM Research - Almaden
San Jose, United States
6 h-index
25 publications
471 citations
MIT Lincoln Laboratory
Lexington, United States
4 h-index
8 publications
129 citations
IBM Research - Thomas J. Watson Research Center
Yorktown Heights, United States
3 h-index
13 publications
189 citations

University of Glasgow
Glasgow, United Kingdom
3 h-index
11 publications
186 citations
NTT (Japan)
Tokyo, Japan
3 h-index
10 publications
298 citations
NEC (Japan)
Tokyo, Japan
3 h-index
11 publications
301 citations
Siemens (Germany)
Munich, Germany
3 h-index
17 publications
259 citations
Massachusetts Institute of Technology
Cambridge, United States
3 h-index
7 publications
116 citations
1–8 of 62
18 publications · 548 citations
14
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8 publications · 112 citations
8
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5 publications · 87 citations
5
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3 publications · 138 citations
3
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2 publications · 39 citations
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1–5