J. Greguš

Reduction imaging at 14 nm using multilayer-coated optics: Printing of features smaller than 0.1 μm

J. E. Bjorkholm, Jeffrey Bokor, L. Eichner et al. · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 1990 · 158 citations

Optical Materials, X-ray Spectroscopy, Engineering +23

Scaling of Si and GaAs trench etch rates with aspect ratio, feature width, and substrate temperature

Andrew D. Bailey, M. C. M. van de Sanden, J. Greguš et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1995 · 61 citations · Full text

Engineering, Electron-beam Lithography, Vacuum Device +17

Multiple steady states in electron cyclotron resonance plasma reactors

Eray S. Aydil, J. Greguš, Richard A. Gottscho · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1993 · 44 citations

Engineering, Multiple Steady States, Plasma Science +17

Incidence angle distributions of ions bombarding grounded surfaces in high density plasma reactors

Eray S. Aydil, B. Quiniou, J.T.C Lee et al. · Materials Science in Semiconductor Processing · 1998 · 30 citations

Engineering, Physics, Surface Science +8

Silicon-on-silicon integration of a GSM transceiver with VCO resonator

P. Davis, Peter G. R. Smith, E. K. Campbell et al. · 2002 · 25 citations

Gsm Transceiver, Electrical Engineering, Engineering +9