A.T. Wu

Deep-submicrometer MOS device fabrication using a photoresist-ashing technique

J.E. Chung, M.-C. Jeng, J.E. Moon et al. · IEEE Electron Device Letters · 1988 · 93 citations

Optical Materials, Engineering, Electron-beam Lithography +18

Asymmetrical characteristics in LDD and minimum-overlap MOSFET's

T.Y. Chan, A.T. Wu, P.K. Ko et al. · IEEE Electron Device Letters · 1986 · 56 citations

Device Modeling, Electrical Engineering, Ion Implantation +11

A novel high-speed, 5-volt programming EPROM structure with source-side injection

A.T. Wu, T.Y. Chan, P.K. Ko et al. · 1986 · 47 citations

Low-power Electronics, Electrical Engineering, Engineering +8

Nitridation induced surface donor layer in silicon and its impact on the characteristics of n- and p-channel MOSFETs

A.T. Wu, T.Y. Chan, V. Murali et al. · 2003 · 42 citations

Engineering, P-channel Mosfets, Optoelectronic Devices +17

Gate bias polarity dependence of charge trapping and time-dependent dielectric breakdown in nitrided and reoxidized nitrided oxides

A.T. Wu, V. Murali, J. Nulman et al. · IEEE Electron Device Letters · 1989 · 38 citations

Semiconductors, Materials Science, Electrical Engineering +15