Isamu Hanyu

Impact of 2-Methyl-2-Adamantyl Group Used for 193-nm Single-Layer Resist

Satoshi Takechi, Makoto Takahashi, Akiko Kotachi et al. · Journal of Photopolymer Science and Technology · 1996 · 42 citations · Full text

Materials Science, Cleavable Adamantyl Ester, Biofunctional Material +13

A 40-ps high electron mobility transistor 4.1 K gate array

Kiyoshi Kajii, Y. Watanabe, M. Suzuki et al. · IEEE Journal of Solid-State Circuits · 1988 · 38 citations

Low-power Electronics, High-electron Mobility Transistor, Electrical Engineering +14

Recent advances in ultrahigh-speed HEMT LSI technology

Masayuki Abe, T. Mimura, Naoki Kobayashi et al. · IEEE Transactions on Electron Devices · 1989 · 35 citations

Semiconductor Technology, Electrical Engineering, Electronic Devices +13

Super low-noise HEMTs with a T-shaped WSi _x gate

Isamu Hanyu, Satoru Asai, Mitsuji Nunokawa et al. · Electronics Letters · 1988 · 35 citations

A Novel Polymer for a 193-nm Resist.

Koji Nozaki, Keiji Watanabe, Ei Yano et al. · Journal of Photopolymer Science and Technology · 1996 · 34 citations · Full text

Materials Science, Engineering, Electronic Materials +15