W. K. Chu - Concepedia

Author

W. K. Chu

University of North Carolina at Chapel Hill

Also Known As

Finstad, T. G., W. Chu, W. K. Chu, W. ‐K. Chu, W.-K. Chu, W.K. Chu, WANG CHU, Wen-Jinn Chu

Publications

617

Citations

H-Index

Concepts

All Affiliations

University of North Carolina at Chapel Hill North Carolina State University University of New Mexico Massachusetts Institute of Technology

About

W. K. Chu is an author at University of North Carolina at Chapel Hill specializing in applied physics, engineering, and physics.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	10	12	583
2	Applied Physics	10	12	583
3	Electrical Engineering	3	3	246
4	Materials Engineering	2	2	62
5	Natural Sciences	1	1	52

W. K. Chu

Publications

583

Citations

H-Index

Page 1

	Year	Citations
Optimization of the germanium preamorphization conditions for shallow-junction formation Mehmet C. Öztürk, J. J. Wortman, C. M. Osburn, IEEE Transactions on Electron Devices Materials ScienceIon ImplantationEngineeringGermanium Preamorphization ConditionsApplied Physics	1988	116
Negative transconductance and negative differential resistance in a grid-gate modulation-doped field-effect transistor K. Ismail, W. K. Chu, Anthony Yen, Applied Physics Letters Device ModelingSemiconductorsElectrical EngineeringSemiconductor TechnologyEngineering	1989	102
Surface-superlattice effects in a grating-gate GaAs/GaAlAs modulation doped field-effect transistor K. Ismail, W. K. Chu, D.A. Antoniadis, Applied Physics Letters SemiconductorsSemiconductor TechnologyElectrical EngineeringElectronic DevicesSurface-superlattice Effects	1988	79
Channeling effect for low energy ion implantation in Si K. Cho, W. R. Allen, T. G. Finstad, Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms Ion ImplantationElectrical EngineeringEngineeringApplied PhysicsSemiconductor Device Fabrication	1985	65
Structural study of GaSb/AlSb strained-layer superlattice C. K. Pan, D. C. Zheng, T. G. Finstad, Physical review. B, Condensed matter X-ray CrystallographyCrystal StructureSuperconducting MaterialEngineeringElasticity Theory	1985	52
Surface modification in plasma-assisted etching of silicon Tatsuaki Mizutani, C.J. Dale, W. K. Chu, Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms EngineeringMicrofabricationSurface ScienceApplied PhysicsSurface Modification	1985	50
Incident-Angle Dependence of Catastrophic Dechanneling for Strained-Layer Superlattices S. T. Picraux, W. R. Allen, R. M. Biefeld, Physical Review Letters Materials ScienceIncident-angle DependenceCatastrophic DepthEngineeringPhysics	1985	43
The Effects of Titanium Silicide Formation on Dopant Redistribution C. M. Osburn, T. Brat, Dipika Sharma, Journal of The Electrochemical Society Materials ScienceSemiconductor TechnologyElectronic DevicesEngineeringCrystalline Defects	1988	29
Ion channeling studies of low energy ion bombardment induced crystal damage in silicon D. J. Vitkavage, C.J. Dale, W. K. Chu, Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms Ion ImplantationEngineeringPhysicsCrystalline DefectsApplied Physics	1986	16
Low resistance ohmic contacts on nitrogen ion bombarded InP F. Ren, S. J. Pearton, J. R. Lothian, Applied Physics Letters Materials ScienceSurface CharacterizationIon ImplantationNitrogen IonEngineering	1994	11

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