Concepedia
Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms · 1985 · 65 citations · 4 references
EngineeringElectrical EngineeringElectronic MaterialsMicroelectronicsSemiconductor DevicesIon ImplantationChanneling EffectsIon Implantation EffectsLow-energy Ion Implantation
4
Boron, fluorine, and carrier profiles for B and BF2 implants into crystalline and amorphous Si
R. G. Wilson · Journal of Applied Physics · 1983 · 173 citations
Engineering, Materials Engineering, Materials Science +17
Channeling effect of low energy boron implant in
T.M. Liu, W.G. Oldham · IEEE Electron Device Letters · 1983 · 95 citations
Natural Sciences, Electrical Engineering, Plasma Physics +9
Critical approach distances and critical angles for channelling
D. V. Morgan, Dirck Van Vliet · Radiation Effects · 1971 · 36 citations
Natural Sciences, Physics, Computational Chemistry +5
The origin of non-Gaussian profiles in phosphorus-implanted silicon
P. Blood, G. Dearnaley, M. A. Wilkins · Journal of Applied Physics · 1974 · 36 citations